发明名称 VAPOR-DEPOSITION MASK, AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a vapor-deposition mask capable of eliminating any downward deflection caused by gravity even when the size of the vapor deposition mask is increased, and its manufacturing method. SOLUTION: The vapor deposition mask 10 has a constitution that a plurality of chips 20 are mounted on a support substrate 30. The support substrate 30 is formed of a laminated substrate 30C in which a first plate 30A having a large coefficient of thermal expansion is joined with a second plate 30B having a small coefficient of thermal expansion. Though the laminated substrate is flat at normal temperature, when the laminated substrate is heated by the heat of radiation at the vapor deposition, a center portion thereof is deflected upwardly due to the bimorph effect of the laminated substrate 30C. Thus, during the vapor deposition, the downward deflection caused by the gravity of the vapor deposition mask 10 is absorbed by the thermal deformation of the support substrate 30 (the laminated substrate 30C), preventing the center portion of the vapor deposition mask 10 from being downwardly deflected due to gravity. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008196002(A) 申请公布日期 2008.08.28
申请号 JP20070031616 申请日期 2007.02.13
申请人 SEIKO EPSON CORP 发明人 IKEHARA TADAYOSHI
分类号 C23C14/24;C23C14/04;C23C14/12;C23C14/50;C23C14/54;C23C14/56;H01L51/50;H05B33/10 主分类号 C23C14/24
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