发明名称 Charged Particle Beam Apparatus
摘要 It is an object of this invention to improve contact precision and probe operability. This invention controls sample stage movement and probe movement on an observation image using a single coordinate system, thereby allowing positioning using a sample stage stop error as a probe control movement amount. This invention also figures out the position of the tip of a probe using the observation image and stores the coordinates of the probe at a reference position on the image. This invention facilitates precise probe contact operation to a sample position of the order of microns.
申请公布号 US2008203299(A1) 申请公布日期 2008.08.28
申请号 US20080037459 申请日期 2008.02.26
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 KOZUMA TOSHIAKI;YOSHIZAWA YUKIO;AIZAWA MEGUMI
分类号 G01N23/225;G21K5/10 主分类号 G01N23/225
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