发明名称 |
Charged Particle Beam Apparatus |
摘要 |
It is an object of this invention to improve contact precision and probe operability. This invention controls sample stage movement and probe movement on an observation image using a single coordinate system, thereby allowing positioning using a sample stage stop error as a probe control movement amount. This invention also figures out the position of the tip of a probe using the observation image and stores the coordinates of the probe at a reference position on the image. This invention facilitates precise probe contact operation to a sample position of the order of microns.
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申请公布号 |
US2008203299(A1) |
申请公布日期 |
2008.08.28 |
申请号 |
US20080037459 |
申请日期 |
2008.02.26 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
KOZUMA TOSHIAKI;YOSHIZAWA YUKIO;AIZAWA MEGUMI |
分类号 |
G01N23/225;G21K5/10 |
主分类号 |
G01N23/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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