发明名称 Capacitance trimming circuit of semiconductor device having vertically stacked capacitor layers and operation method thereof
摘要 A capacitance trimming circuit of a semiconductor device may include a plurality of capacitor layers and/or a plurality of fuses. The plurality of capacitor layers may be vertically stacked. The plurality of fuses may be arranged to correspond to the plurality of capacitor layers, and/or the plurality of fuses may be configured to select corresponding ones of the plurality of capacitor layers for controlling a capacitance of the plurality of capacitor layers.
申请公布号 US2008203525(A1) 申请公布日期 2008.08.28
申请号 US20080071847 申请日期 2008.02.27
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JANG MYOUNG-JUN;PARK TAE-SOO
分类号 H01L23/538;H01L21/768 主分类号 H01L23/538
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