发明名称 |
DEVICE AND METHOD FOR MEASURING HEIGHT OF PROJECTION OBJECT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device and method for measuring height capable of accurately measuring the height of a projection object on the surface of an object to be inspected representative of a bump or the like of a bump wafer regardless of the state of the upper face of the projection object. <P>SOLUTION: The device for measuring the height of the projection object of the surface of the object to be inspected includes: an irradiation optical system for irradiating the bump wafer 1 with irradiation light; a detection optical system for detecting reflection light from the bump wafer 1; a bump measuring region setting part 73 for setting a bump height measuring region 802 to the bump 88 of a measuring object based on bump arrangement information 801 on the bump wafer 1; a statistic processing part 74 for calculating a movement average value 902 by averaging height data 703 of a movement average calculation region 901 in the bump height measuring region 802; a contour line calculation part 75 for calculating a contour line 904 of a cross section of the bump 88 based on the movement average value 902; and a bump height determining part 76 for determining a peak value of the contour line 904 as bump height. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008196974(A) |
申请公布日期 |
2008.08.28 |
申请号 |
JP20070032450 |
申请日期 |
2007.02.13 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
SAKATA MASANOBU;ISHIMORI HIDEO;OGAWA TETSUYUKI |
分类号 |
G01B11/02;H01L21/60 |
主分类号 |
G01B11/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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