发明名称 |
CONTAMINATION ANALYZING APPARATUS, ITS METHOD, AND RETICLE WASHING SYSTEM USING IT |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an apparatus and method for analyzing contamination capable of improving the reliability of inspection when the contamination remaining on the inspection surface is analyzed after washing an inspecting object such as a reticle. <P>SOLUTION: The apparatus for analyzing the contamination remaining on the inspection surface of the inspecting object comprises a sampling module for bringing the inspection surface of the inspecting object into contact with liquid and extracting sampling liquid, and an analyzer for analyzing the contaminant remaining on the inspection surface of the inspecting object from the sampling liquid. The sampling module comprises a liquid tank having a storage space capable of storing the inspection surface of the inspecting object, and a liquid supply nozzle for supplying the liquid to the storage space of the liquid tank. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
申请公布号 |
JP2008197109(A) |
申请公布日期 |
2008.08.28 |
申请号 |
JP20080034440 |
申请日期 |
2008.02.15 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
LEE OK-SUN;CHOI HYUNG-SEOK;AHN YO-HAN;KIM JI-YOUNG |
分类号 |
G01N1/00;G01N1/10;G03F1/84 |
主分类号 |
G01N1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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