发明名称 NONVOLATILE SEMICONDUCTOR MEMORY
摘要 PROBLEM TO BE SOLVED: To enable an improvement in the characteristics of a high voltage-resistant MIS transistor and a reduction in the area of a circuit including the high voltage-resistant MIS transistor. SOLUTION: A nonvolatile semiconductor memory of the present invention comprises: a monocrystalline semiconductor substrate 21 having a first epitaxial layer 22 on the surface thereof; and a plurality of memory cells MC and high voltage-resistant transistors HVTr arranged on the monocrystalline semiconductor substrate 21. The impurity concentration of the monocrystalline semiconductor substrate 21 is lower than that of the first epitaxial layer 22. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008198866(A) 申请公布日期 2008.08.28
申请号 JP20070033949 申请日期 2007.02.14
申请人 TOSHIBA CORP 发明人 KUTSUKAKE HIROYUKI;ISHIDA KIKUKO;NOGUCHI MITSUHIRO;KAMIGAICHI TAKESHI
分类号 H01L21/8247;H01L21/8234;H01L27/088;H01L27/10;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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