发明名称 |
NONVOLATILE SEMICONDUCTOR MEMORY |
摘要 |
PROBLEM TO BE SOLVED: To enable an improvement in the characteristics of a high voltage-resistant MIS transistor and a reduction in the area of a circuit including the high voltage-resistant MIS transistor. SOLUTION: A nonvolatile semiconductor memory of the present invention comprises: a monocrystalline semiconductor substrate 21 having a first epitaxial layer 22 on the surface thereof; and a plurality of memory cells MC and high voltage-resistant transistors HVTr arranged on the monocrystalline semiconductor substrate 21. The impurity concentration of the monocrystalline semiconductor substrate 21 is lower than that of the first epitaxial layer 22. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008198866(A) |
申请公布日期 |
2008.08.28 |
申请号 |
JP20070033949 |
申请日期 |
2007.02.14 |
申请人 |
TOSHIBA CORP |
发明人 |
KUTSUKAKE HIROYUKI;ISHIDA KIKUKO;NOGUCHI MITSUHIRO;KAMIGAICHI TAKESHI |
分类号 |
H01L21/8247;H01L21/8234;H01L27/088;H01L27/10;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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