| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of improving throughput in substrate processing sufficiently. SOLUTION: The substrate processing apparatus 500 includes an indexer block 9, a processing block 10 for reflection prevention films, a processing block 11 for resist films, a processing block 12 for resist cover films, a development processing block 13, a resist cover film removal block 14, a cleaning/drying processing block 15, and an interface block 16. The blocks 9-16 are juxtaposed in the above order. The exposure system 17 is arranged adjacent to the interface block 16. In the exposure system 17, a substrate W is exposed to light by an immersion liquid method. The development processing block 13 includes development processing sections 60a, 60b and a fifth center robot CR5. The development processing sections 60a, 60b sandwich the fifth center robot CR5 and are provided while facing each other. COPYRIGHT: (C)2008,JPO&INPIT
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