| 摘要 |
PROBLEM TO BE SOLVED: To provide a wavefront aberration measuring device capable of measuring aberration to be generated in a diffraction grating. SOLUTION: The wavefront aberration measuring device includes: a first mask 10 having a plurality of first optical parts 11 for generating a spherical wave; the diffraction grading 40 for separating light coming by way of an optical system to be inspected 30 via the first mask; and an operational part 51 for generating information concerning the wavefront aberration of the optical system to be inspected, based on interference patterns to be generated by the mutual interference of separation lights from the diffraction grading. The device also includes: a plurality of second optical parts 21 for generating the spherical wave; and a second mask 20 which is arranged between the optical system to be inspected and the diffraction grading and is movable into/out of an optical path. The operational part generates the information concerning the wavefront aberration of the optical system to be inspected, where the aberration to be generated in the diffraction grading is corrected, based on the first interference pattern to be acquired in a state where the second mask is arranged at the inside of the optical path, and the second interference pattern to be acquired in a state where the second mask is arranged at the outside of the optical path. COPYRIGHT: (C)2008,JPO&INPIT
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