PLASMA PROCESSING EQUIPMENT

摘要

Plasma processing equipment (A) in which plasma generating gas (G) is activated by discharge and an article (H) is processed by blowing the activated plasma generating gas (G) thereto. A coated electrode (3) is formed by burying a conductive layer (2) in an insulating substrate (1) composed of a ceramic sintered body. A plurality of coated electrodes (3, 3, ...) are arranged oppositely to form a discharge space (4) between them. A power supply (5) is provided in order to generate discharge in the discharge space (4) by applying a voltage to the conductive layer (2). Since a ceramic material is not sprayed, material cost of the coated electrode (3) can be reduced while the production process can be simplified. Since the ceramic sintered body is compact and has a low porosity as compared with a coating of ceramic spray, dielectric breakdown is retarded during discharge.