| 发明名称 |
AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, AND KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING |
| 摘要 |
Disclosed is an aqueous dispersion for chemical mechanical polishing which contains (A) abrasive grains having a pore volume of not less than 0.14 ml/g and (B) a dispersion medium. |
| 申请公布号 |
KR20080078897(A) |
申请公布日期 |
2008.08.28 |
| 申请号 |
KR20087017157 |
申请日期 |
2006.12.04 |
| 申请人 |
JSR CORPORATION |
发明人 |
IKEDA NORIHIKO;UENO TOMIKAZU |
| 分类号 |
C09K3/14;B24B37/00;H01L21/304 |
主分类号 |
C09K3/14 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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