| 摘要 |
PROBLEM TO BE SOLVED: To prevent damage of a workpiece in various machining apparatuses by protecting the workpiece against electrostatic electricity. SOLUTION: In a holding table 43 constituted with an attracting part 43b for attracting a wafer W and a frame 43a surrounding the attracting part 43b, the conductive property of the holding table 43 is improved to control charging of the wafer W with static electricity by forming the attracting part 43b with porous ceramics mainly formed of zirconia and forming the frame 43a with a conductive member. COPYRIGHT: (C)2008,JPO&INPIT |
