APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a processing apparatus capable of processing a substrate favorably by efficiently generating nano bubbles. SOLUTION: The processing apparatus for processing a substrate by using a processing solution is provided with a nano bubble generating means, which generates nano bubbles and mixes the nano bubbles in the processing solution. The nano bubble generating means is configured with a gas shearer 2 wherein a shearing chamber 3 is formed inside, a gas supply port 6 which is provided at one end part in an axial direction of the gas shearer to supply a gas to a shearing chamber by swirling, and a liquid supply port 7 which is provided on the outer peripheral surface of one end part of the gas shearer to supply the processing solution to the shearing chamber by swirling and generates the nano bubbles from the gas by a difference of swirling speed between the processing solution and the gas. COPYRIGHT: (C)2008,JPO&INPIT