发明名称 Verfahren und Vorrichtung zur Herstellung von Halbleiterkristallen
摘要 An apparatus of producing a semiconductor crystal comprising a reactor tube having an open end in at least one end side, formed of any one material selected from the group consisting of silicon carbide, silicon nitride, aluminum nitride, and aluminum oxide, or of a composite material with any one material selected from the group consisting of silicon carbide, silicon nitride, aluminum nitride, boron nitride, aluminum oxide, magnesium oxide, mullite, and carbon as a base, and having an oxidation-proof or airtight film formed on a surface of the base, heat means arranged around said reactor tube in the atmosphere, a flange attached at said open end to seal said reactor tube and a crucible mounted in said reactor tube to store a material of said semiconductor crystal.
申请公布号 DE69839723(D1) 申请公布日期 2008.08.28
申请号 DE1998639723 申请日期 1998.12.22
申请人 SUMITOMO ELECTRIC INDUSTRIES LTD. 发明人 HASHIO, KATSUSHI;SAWADA, SHIN-ICHI;TATSUMI, MASAMI
分类号 C30B11/00;H01L21/208;C30B15/00;C30B29/42 主分类号 C30B11/00
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