COMPOSITION FOR FORMING ANTI-REFLECTION FILM, AND RESIST PATTERN FORMING METHOD USING IT

摘要

PROBLEM TO BE SOLVED: To provide a composition for forming an anti-reflection film without generating a deposit or the like after forming the film by having easy handling in the composition for forming the anti-reflection film used when forming the anti-reflection film on a resist film.

SOLUTION: The composition for forming the anti-reflection film of forming the anti-reflection film provided on the resist film contains at least a prescribed fluorine based surfactant and a prescribed component for forming a water-soluble film. The composition for forming the anti-reflection film is easy in handling and does not generate the deposit or the like after forming the anti-reflection film without affecting health and environments.

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