发明名称 LIQUID DISCHARGE METHOD AND LIQUID DISCHARGE APPARATUS
摘要 PROBLEM TO BE SOLVED: To highly accurately form a resist pattern having a predetermined film thickness. SOLUTION: The liquid discharge method comprises discharging a resist ink containing resist particles dispersed in a solvent from a plurality of nozzles toward a substrate, wherein an average particle size per volume of the particles is set larger than the film thickness of the solvent of the resist ink which has been splashed on the substrate and has become a balanced state. By providing the method, the problem can be solved. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008198736(A) 申请公布日期 2008.08.28
申请号 JP20070031122 申请日期 2007.02.09
申请人 FUJIFILM CORP 发明人 INOUE SEIICHI
分类号 H05K3/00;B05C5/00;B05D1/26;B41J2/01;H05K3/06;H05K3/18 主分类号 H05K3/00
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