| 摘要 |
PROBLEM TO BE SOLVED: To provide a spin cleaning device in which the surface density of ultrasonic energy being supplied to a substrate to be cleaned can be adjusted easily, and to provide a cleaning method employing that device. SOLUTION: The cleaning device includes a rotary table for fixing a substrate to be cleaned horizontally for a short time, a nozzle for ejecting liquid to which an ultrasonic wave is applied, a distributor irradiated with the liquid ejected by the ultrasonic nozzle, a support for fixing the distributor in parallel with the substrate to be cleaned while spacing apart therefrom by a predetermined distance, a conduit for passing the cleaning liquid supplied between the distributor and the substrate to be cleaned and opening to the space formed therebetween, and a device for causing the ultrasonic nozzle to reciprocate between the center of rotation of the substrate to be cleaned and the outer circumferential part. COPYRIGHT: (C)2008,JPO&INPIT
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