发明名称 PATTERNING OF MECHANICAL LAYER IN MEMS TO REDUCE STRESSES AT SUPPORTS
摘要 A method of fabricating a MEMS device includes the formation of support posts having horizontal wing portions at the edges of the post. A mechanical layer is deposited over the support posts and portions of the mechanical layer overlying portions of the support post other than the horizontal wing portions are etched away. A resultant MEMS device includes a mechanical layer overlying at least a portion of the horizontal wing portions of the underlying support structures.
申请公布号 WO2008054504(A3) 申请公布日期 2008.08.28
申请号 WO2007US08910 申请日期 2007.04.09
申请人 QUALCOMM MEMS TECHNOLOGIES, INC.;TUNG, MING-HAU;CHUNG, WONSUK 发明人 TUNG, MING-HAU;CHUNG, WONSUK
分类号 G02B26/00;B81C1/00 主分类号 G02B26/00
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