METHOD AND SYSTEM FOR CONTROLLING A VAPOR DELIVERY SYSTEM

摘要

A method and system is provided for determining and controlling the amount of film precursor vapor delivered to a substrate in a vapor deposition system. The system comprises a vapor delivery system comprising a carrier gas supply system to supply a first flow of carrier gas and a second flow of carrier gas that by-passes the precursor evaporation system. The vapor delivery system comprises a carrier gas flow control system to control the amount of the first flow of the gas and control the amount of the second flow of the carrier gas as well as a film precursor vapor flow measurement system. A controller is configured to compare the measured amount of the precursor vapor to a target amount, to adjust the amount of the first and second flow of earner gas such that the measured amount of the film precursor vapor is substantially equal to the target amount.