发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING RIGID SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To reduce the deformation of a rigid substrate after resin is sealed and the deformation of a semiconductor element when resin is sealed by improving the rigid substrate and a resin sealing metal mold in a manufacturing method of a resin sealing-type semiconductor device using the rigid substrate. SOLUTION: The manufacturing method of the semiconductor device comprises a process for installing a notch in a lower metal mold opposing the substrate end of a part sandwiched between an upper metal mold and the lower metal mold on the bent side of the metal mold, a process for arranging the rigid substrate on the metal mold and a process for pouring resin into a space between the upper metal mold of the metal mold and the rigid substrate and resin-sealing the semiconductor element. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008199065(A) 申请公布日期 2008.08.28
申请号 JP20080130919 申请日期 2008.05.19
申请人 FUJITSU LTD 发明人 NAGAHAMA YOHEI;WAKAO KATSUNORI;ASANO YUICHI;TAKAHASHI MASANORI;KOJIMA HARUO;FUJIMOTO MASAMICHI;OTSUBO HIROSHI;YASUDA YUKI
分类号 H01L21/56 主分类号 H01L21/56
代理机构 代理人
主权项
地址