| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inexpensive positive photosensitive composition by having high sensitivity and high resolution and having wide development latitude, and to provide a pattern forming method. <P>SOLUTION: The positive photosensitive composition includes at least (A) an alkali-soluble resin, and (B) a novolak resin having a group, which decomposes due to the action of acid, and having increased solubility to alkali aqueous solution after decomposition, solubility to alkali aqueous solution and (C) a compound generating acid due to the action of light. One embodiment in which the alkali-soluble resin (A) is a resin having at least one phenolic hydroxyl group and at least one carboxylic acid group, and another embodiment in which at least a part of hydroxyl groups in the novolak resin of (B) is substituted with at least one of an alkoxy alkyl group, an alkoxy carbonyl group and a silyl group are preferable. <P>COPYRIGHT: (C)2008,JPO&INPIT |
