| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an EUV exposure system capable of precisely managing the thermal expansion of a photomask by controlling and managing a temperature of the photomask during both standby and use. <P>SOLUTION: The exposure system comprises a photomask 6 having a multilayer reflecting film formed on the surface of a glass substrate and an absorbing body formed in a specified pattern on the surface of the reflecting film, a mask holder 10 of glass to which the glass substrate is secured, a heating body 11 housed in a mask holder, a temperature detecting means 14 for detecting a temperature of the photomask, and a control part 12 which controls a heating value of the heating body so that the temperature of the photomask reaches a specified temperature based on the detection result of the temperature detecting means. <P>COPYRIGHT: (C)2008,JPO&INPIT |
