发明名称 EXPOSURE SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To convey a wafer automatically without manual help as much as possible in a case when a wafer is brought into a state where the same can not be retained on a wafer stage during conveyance by a wafer supporting unit and the subsequent conveyance can not be guaranteed. <P>SOLUTION: Measurement of existence of the wafer is effected through an absolute coordinate in the device utilizing the existing sensors 5, 6, 7 to determine the posture (amount, direction and inclination of deviation) of the wafer based on the information. The information is compared with a preset allowable amount to judge the possibility of the conveyance and when it is possible, the conveyance is carried out. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008198754(A) 申请公布日期 2008.08.28
申请号 JP20070031516 申请日期 2007.02.13
申请人 CANON INC 发明人 KAZAANA TETSUSHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址