| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which satisfies high sensitivity and good density distribution dependency at the same time, and also ensures good line width roughness and a good dissolution contrast, and a pattern forming method using the same. <P>SOLUTION: The resist composition includes: (A) a resin containing a repeating unit having a specific secondary benzyl structure; and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation. The pattern forming method using the same is also provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
