发明名称 |
Method for designing semiconductor device and semiconductor device |
摘要 |
A method for designing a semiconductor device and a semiconductor device of the present invention permits the achievement of a predetermined pattern area ratio while power supply lines are reinforced by connecting a dummy metal line, which is formed in an unoccupied region of a wiring layer for the purpose of achieving the predetermined area ratio, at its two or more points with a power supply line for VDD or VSS. |
申请公布号 |
US2008203562(A1) |
申请公布日期 |
2008.08.28 |
申请号 |
US20080081727 |
申请日期 |
2008.04.21 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
ARAKI TAKAYUKI;KIMURA FUMIHIRO;SHIMADA JUNICHI;FUJITA KAZUHISA |
分类号 |
H01L23/48;G06F17/50 |
主分类号 |
H01L23/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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