| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inexpensive positive photosensitive composition which has high sensitivity and high resolution and hardly causes the missing of an image part, and to provide a pattern forming method. <P>SOLUTION: The positive photosensitive composition at least includes (A) a novolak resin having a group, which decomposes due to the action of acid, and having increased solubility to alkali aqueous solution after decomposition, and (B) a compound generating acid due to the action of light. The novolak resin of the (A) is formed by polycondensing phenols and an aldehyde compound, and the phenols are at least three kinds of phenolic monomers. <P>COPYRIGHT: (C)2008,JPO&INPIT |
