| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an illuminating device that can detect the positions of a plurality of illuminating areas, and to provide an exposure system, a method of adjusting the exposure system and a method of manufacturing a device. <P>SOLUTION: The exposure system 1 is provided with an illuminating device IL, a mask stage 3 to support a mask M, an illuminating field stop position changing unit 30, a projection optical unit 40, and a plate stage 4 to support a plate P. The illuminating device IL is provided with: an illuminating optical unit 10 having a plurality of illuminating optical systems 11, wherein a plurality of illuminating areas are formed on the pattern face Ma of the mask M; and an illuminating area position detecting unit 20 to detect the positions of the illuminating areas formed on the pattern face Ma. Each of the illuminating optical systems 11 is provided with an illuminating field stop 15 to regulate an illuminating area on the pattern face Ma, and the illuminating area position detecting unit 20 detects an image of the illuminating field stop 15 formed on the pattern face Ma. <P>COPYRIGHT: (C)2008,JPO&INPIT |
