| 摘要 |
PROBLEM TO BE SOLVED: To provide a device for measuring a mask and a substrate with fine structure, not being influenced by heat of a lighting system. SOLUTION: In this position measuring device regarding a coordinates system of a structure (3) on an object (2), the object (2) is placed on a measuring table (20) which moves on a plane (25a) defined by a block (25), and one or more optical devices (40, 50) are arranged for vertical light illumination and/or transmissive light illumination. The optical devices (40, 50) include the lighting systems (41, 51) for vertical light illumination, and/or transmissive light illumination, and one or more first or second optical elements (9a, 9b), and at least some of the one or more first or second optical elements (9a, 9b) are extended in a space between the block (25) and an optical system support (100). The block (25) and/or the optical system support (100) spatially separates the lighting systems (41, 51) from the plane where the measuring table (20) moves. COPYRIGHT: (C)2008,JPO&INPIT
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