| 摘要 |
The present invention provides a chemically amplified resist composition comprising: (A) a salt represented by the formula (I): <EMI ID=1.1 HE=16 WI=46 LX=515 LY=217 TI=CF> <PC>wherein R<21> represents a C1-C30 hydrocarbon group or the like, Q<1> and Q<2> each independently represent a fluorine atom etc., and A<+> represents at least one organic cation selected from a cation represented by the formula (Ia): <EMI ID=1.2 HE=15 WI=37 LX=505 LY=664 TI=CF> <PC>wherein P<1>-P<3> each independently represent a C1-C30 alkyl group or the like, a cation represented by the formula (Ib): <EMI ID=1.3 HE=16 WI=58 LX=498 LY=1016 TI=CF> <PC>wherein P<4> and P<5> each independently represent a hydrogen atom or the like, and a cation represented by the formula (Ic): <EMI ID=1.4 HE=62 WI=108 LX=494 LY=1314 TI=CF> wherein P<10>-P<21> each independently represent a hydrogen atom or the like, B represents a sulfur or oxygen atom and m represents 0 or 1; (B) a salt represented by the formula (II): wherein R<22> represents a C1-C30 hydrocarbon group or the like, Q<3> and Q<4> each independently represent a fluorine atom or the like, and A'<+> represents an organic cation represented by the formula (IIa): wherein P<6> and P<7> each independently represent a C1-C12 alkyl group or the like, P<8> represents a hydrogen atom, P<9> represents a C1-C12 alkyl group or the like; and (C) a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid. |
