发明名称 METHOD FOR PATTERNING NANOPARTICLES BY PULSED LASER
摘要 A method for patterning nanoparticles by pulsed laser is provided to control a desired space pattern of nanoparticles freely by space distribution control of pulsed energy, and to realize simple and rapid patterning. A method for patterning nanoparticles by pulsed laser includes the steps of: providing a substrate having a mono-layered or multi-layered nanoparticle thin film; shining a pulsed laser on desired portions of the nanoparticle thin film through a prism in a laser beam irradiation unit; and modulating an energy density space distribution of the pulsed laser for the nanoparticle thin film by multiple laser beam interference, wherein if energy density of the pulsed laser is over a threshold value, force by a thermoelastic effect of nanoparticles is greater than adhesive force of a substrate with nanoparticles, thereby separating the desired portions of the nanoparticle thin film from the substrate.
申请公布号 KR100838344(B1) 申请公布日期 2008.06.17
申请号 KR20070030147 申请日期 2007.03.28
申请人 INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY 发明人 LEE, MYEONG KYU;SHIN, HYUN KWON;KIM, HYUN JUN;HA, JUNG MIN
分类号 B82B3/00 主分类号 B82B3/00
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