METHOD AND APPARATUS FOR DEPOSITION OF BIAXIALLY TEXTURED COATINGS

摘要

A deposition method and apparatus is described for manufacture of biaxially textured coatings where the biaxial texturing is induced by bombardment during deposition by energetic particles under a specifically controlled angle. The method for deposition of biaxially textured coatings onto a substrate (6) utilizes one or more magnetron sputtering devices (1) generating both a flux of material to be deposited and a flux (5) of energetic particles with a controllable direction and thereby controllable angle of incidence on the substrate (6). The magnetron sputter source (1) generates a beam (5) of energetic particles together with material to be deposited, said source being adapted so that said beam (5) is directed towards a substrate (6) under an angle controlled in such a way that a biaxially textured coating is deposited on the substrate (6).