发明名称 Method of forming bumps on a wafer utilizing a post-heating operation, and an apparatus therefore
摘要 A bump forming apparatus which carries out a temperature control of a type different from the conventional art in forming bumps to a semiconductor wafer, and a bump formation method executed by the bump forming apparatus are provided. A bonding stage, a load and transfer device and a control device are provided. A wafer, after having bumps formed thereon, is held by the load and transfer device and arranged above the bonding stage through control by the control device, so that a temperature drop of the wafer is controlled. Accordingly, generation of troubles such as a crack because of thermal stress and the like can be prevented to even compound semiconductor wafers sensitive to a temperature change.
申请公布号 US7387229(B2) 申请公布日期 2008.06.17
申请号 US20040761412 申请日期 2004.01.22
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 IMANISHI MAKOTO;NARITA SHORIKI;IKEYA MASAHIKO;KANAYAMA SHINJI;MAE TAKAHARU
分类号 B23K37/04;H01L21/00 主分类号 B23K37/04
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