发明名称 |
Support system for a treatment apparatus |
摘要 |
A system for an apparatus of the type adapted to treat substrates and/or wafers is described and comprises a stationary base element and a movable support for at least one substrate or at least one wafer, the support being rotatable above the element about a stationary axis; a chamber, and at least one duct is provided for the admission of at least one gas-flow to the chamber in order to raise the support; the system also comprises means for converting the flow of gas into the chamber into rotation of the support.
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申请公布号 |
US7387687(B2) |
申请公布日期 |
2008.06.17 |
申请号 |
US20050538547 |
申请日期 |
2005.06.10 |
申请人 |
E.T.C. EPITAXIAL TECHNOLOGY CENTER SRL |
发明人 |
SPECIALE NATALE;VALENTE GIANLUCA;CRIPPA DANILO;PRETI FRANCO |
分类号 |
C23C16/00;C23C16/458;C23C16/46;C30B25/10;C30B25/12;C30B31/14;F27B14/06;H01L21/00;H01L21/687;H05B6/02 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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