发明名称 CLEANING BATH FOR SUBSTRATE AND CLEANING APPARATUS HAVING THE SAME
摘要 A substrate cleaning container and a substrate cleaning apparatus including the same are provided to prevent a rinse container from being damaged due to a cleaning solution. A container has an opened upper portion to fill a cleaning solution therein. A protection member(330) covers portions of a sidewall and upper region of the container to protect a portion of the container. The container has an inner container(322) and an outer container(324) enclosing the inner container. The protection member is formed at a portion of the sidewall and upper region of the outer container. The protection member is formed along an inner surface, an upper surface and an outer surface of the outer container.
申请公布号 KR20080053651(A) 申请公布日期 2008.06.16
申请号 KR20060125436 申请日期 2006.12.11
申请人 K.C.TECH CO., LTD. 发明人 CHO, HYUN WOO
分类号 H01L21/304 主分类号 H01L21/304
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