| 摘要 |
<p>An exposure device and a method of fabricating a semiconductor substrate using the same are provided to achieve double exposure effect by one exposure process by splitting beam of light into two polarized beams and using them for exposure. An exposure device comprises a light source, a beam splitter(100), a polarizer(200), a beam collector(300), and a reticle. The beam splitter has a photonic crystal structure to be located along a proceeding direction of beam of light emitted by the light source. The polarizer is disposed on two light emitting parts of the beam splitter. The beam collector is installed on the other side of the beam splitter about the polarizer. The reticle is located on a proceeding direction of the beam passed through the beam collector.</p> |
