APPARATUS FOR FABRICATING SEMICONDUCTOR AND METHOD FOR FORMING SEMICONDUCTOR DEVICE USING THE SAME

摘要

An apparatus for fabricating a semiconductor and a method for forming a semiconductor device using the same are provided to maintain a constant interval between an exposure lens and a wafer by installing a device for floating the wafer in a wafer chuck. A wafer chuck(110) is installed in an inside of a chamber in order to support a wafer(150). A gas injection nozzle(140) is installed at an inner surface of the wafer chuck. A gas supply system(160) supplies gas to the gas injection nozzle. A supporting pin is formed to support a sidewall of the wafer. The supporting pin moves downwardly in the inside of the wafer chuck in order to maintain a floating state of the wafer while the gas is supplied to the gas injection nozzle. The gas injection nozzle is positioned at a predetermined point corresponding to 1/2 to 2/3 from a center of the wafer chuck.