发明名称 TOPICAL COMPOSITIONS FOR REDUCING SKIN IRRITATION.
摘要 The invention relates to organic compounds having the ability to reduce or suppress the onset of skin irritation induced by extraneous cause selected from the group of 2-heptylcyclopentanone, 2-ethoxynaphthalene; 2-methoxynaphthalene; 1-methoxy-4-(prop-1-enyl)benzene; 1-(cyclopropylmethyl)-4-methoxybenzene; (formulae a, b, c, d, da??, e) wherein X, Y, and R<sup>1</sup> to R<sup>11</sup> have the same meaning as given in the description. Furthermore the invention refers to compositions for topical application to the skin comprising them. It further relates to a method of reducing or suppressing the formation of skin irritation.
申请公布号 MX2008002811(A) 申请公布日期 2008.04.07
申请号 MX20080002811 申请日期 2006.09.08
申请人 GIVAUDAN SA. 发明人 ANDREAS NATSCH.;MICHAEL WASESCHA
分类号 A61K8/37;A61K8/33;A61K8/40;A61Q13/00;A61Q15/00;A61Q17/04;A61Q19/00 主分类号 A61K8/37
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