发明名称 ETCHING DEVICE AND METHOD FOR ELECTROLESS PLATING
摘要 An etching device and a etching method for electroless plating are provided to perform a light catalyst etching using ultra violet and visual light as well, and increase etching efficiency by having an excellent dispersion property. An etching device for an electroless plating includes a belt type fixing frame(6), a sol supply(10), a retrieve container(14), a pipeline(12), and a pump(13). The belt type fixing frame is turned around by a roll(8) and fixes components to be etched. The sol supply supplies titanium dioxide sol in an upper part of the belt type fixing frame. The retrieve container retrieves the titanium dioxide sol in a lower part of the belt type fixing frame. The pipeline connects the retrieve container and the sol supply for transporting the titanium dioxide sol from the retrieve container to the sol supply. The pump is connected midway through the pipeline.
申请公布号 KR100770047(B1) 申请公布日期 2007.10.26
申请号 KR20060049046 申请日期 2006.05.30
申请人 INDUSTRY-ACADEMIA COOPERATION GROUP OF SEJONG UNIVERSITY 发明人 KIM, SUN JAE;LEE, NAM HEE;KIM, GYUNG GUK;SHIN, SEUNG HAN;OH, HYO JIN;YOON, CHO RONG;KIM, SEON JIN;KANG, JOUNG AH
分类号 C23F1/08 主分类号 C23F1/08
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