| 摘要 |
PROBLEM TO BE SOLVED: To measure a thickness of a film comprising a double-refractive material formed on a substrate. SOLUTION: In this method evaluating the thickness of the film comprising the double-refractive material formed on the substrate, an observation wavelength range of light is made incident into the film to measure the intensity of interference light generated in the the film, and the thickness of the film is evaluated using a measured data, by the Expression (1), where I(λ) represents the intensity of the interference light; n<SB>0</SB>represents a refractive index of normal light in the film; n<SB>e</SB>represents a refractive index of abnormal light in the film, d represents the thickness of the film; andλrepresents a wavelength of the light incident into the film respectively, in the Expression (1). COPYRIGHT: (C)2007,JPO&INPIT
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