发明名称 PATTERN FORMATION METHOD AND LIQUID DROPLET DISCHARGE APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a pattern formation method by which the relative speed of droplets is easily changed along the tangent direction of the object fact to which droplets are discharged while the positioning precision of the impact positions of the discharged droplets is maintained. <P>SOLUTION: An inclined stage 29 having a curvature center Cr as a rotation center is installed in a substrate 2 side of a carriage 27 and a discharge head 30 is installed on the inclined stage 29. When the inclined stage 29 is transferred from "the reference position" to "the inclined position", the respective nozzles N of the discharge head 30 are rotated around the respectively corresponding impact positions PF (curvature center Cr) as a rotation center to incline the formation direction at a tilting angleθin the direction shown as an arrow Z. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007117922(A) 申请公布日期 2007.05.17
申请号 JP20050315136 申请日期 2005.10.28
申请人 SEIKO EPSON CORP 发明人 IWATA YUJI
分类号 B05D1/26;B05C5/00;B05C9/12;B05C9/14;G02B5/20 主分类号 B05D1/26
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