| 摘要 |
PROBLEM TO BE SOLVED: To uniformly feed a gaseous starting material to the whole region of a substrate in a state where the increase of the area on the whole of a device is suppressed even if a substrate having a larger area is used as an object. SOLUTION: In the device, a circulation straight line piping part 131 and a feed straight line piping part 133 are arranged so as to be elongated to the direction parallel to the plane of a substrate W mounted on a substrate stand 102. The circulation straight line piping part 131 and the feed straight line piping part 133 are arranged so as to be elongated to a direction vertical to the gas feed direction. The circulation straight line piping part 131 and the feed straight line piping part 133 are connected by an outward trip bent piping part 132 and a return trip bent piping part 135, so as to compose a circulation path. Further, a plurality of gas discharge ports 134 are formed at the feed straight line piping part 133. COPYRIGHT: (C)2007,JPO&INPIT
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