| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface treatment method of a sapphire substrate capable of removing easily and inexpensively scratches of some to tens of nanometers (nm) existing in the sapphire substrate surface after mirror finished surface, where a foreign substance is not adhered. <P>SOLUTION: A mixed solution of 100-200°C concentrated phosphoric acid and concentrated sulfuric acid, in a container which does not include Si as a constituent and has the quality of the material which remains unaltered by a mixed solution of concentrated phosphoric acid and concentrated sulfuric acid, preferably made from polytetrafluoroethylene resin, is brought into contact with the mirror finished sapphire substrate surface pinched with a holding fixture which does not include Si as a constituent and has the quality of the material which remains unaltered by a mixed solution of phosphoric acid and sulfuric acid, preferably made from polytetrafluoroethylene resin. Further, the mixed solution of concentrated phosphoric acid and concentrated sulfuric acid is obtained such that the phosphoric acid and the sulfuric acid are mixed to be set as 1:3-3:1 by volume ratio. <P>COPYRIGHT: (C)2007,JPO&INPIT |
