| 摘要 |
PROBLEM TO BE SOLVED: To enable a final processing of development steps with new clean developer, and changing a surface of a substrate into a cleaned state when the development is finished, by supplying the new developer to the surface of the substrate terminating the development. SOLUTION: This substrate treatment equipment 1 is provided with a liquid layer forming chamber 2 which supplies the developer to the surface of the substrate S carried in a horizontal attitude to form a liquid layer of the developer on the surface of the substrate S due to the surface tension of the developer, a treatment progressing chamber 3 which holds the substrate S formed with the liquid layer of the developer and advances treatment with the developer of the liquid layer, and an attitude converting chamber 4 which converts the attitude of the substrate S after the treatment with the liquid layer of the developer into a slant attitude, wherein the attitude converting chamber 4 supplies the developer to the surface of the substrate S turned into the slant attitude. COPYRIGHT: (C)2007,JPO&INPIT |
