发明名称 LIQUID JET HEAD MANUFACTURING METHOD AND LIQUID JET DEVICE PROVIDED WITH LIQUID JET HEAD
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid jet head in which discharge characteristics are stabilized by preventing occurrence of projecting etching residues on an etching face of a vibrating plate manufactured by etching, and a liquid jet device provided with the liquid jet head. SOLUTION: A pressure chamber of a flow passage forming substrate and the vibrating plate are formed by performing a first etching step, in which a high-concentration boron-doped layer is formed on one face of an Si substrate and etching is performed from the other face opposite to the one face to the halfway of the Si substrate with an etchant having a concentration adjusted to≤30 wt.%, and then, a second etching step in which etching is performed from the part etched in the first etching step to a part reaching the high-concentration boron-doped layer with an etchant having a concentration lower than that of the etchant used in the first etching step. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007118393(A) 申请公布日期 2007.05.17
申请号 JP20050313736 申请日期 2005.10.28
申请人 SEIKO EPSON CORP 发明人 YAMASHITA MASAHIRO
分类号 B41J2/16;B41J2/045;B41J2/055 主分类号 B41J2/16
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