发明名称 PHOTOSENSITIVE RESIN COMPOSITION, DISPLAY SUBSTRATE, AND ITS PATTERN FORMING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition being excellent in flatness after development, sensitivity, resolution, heat resistance, transparency, and the like; capable of reducing its electric power consumption, especially by realizing an organic insulation film having a low dielectric constant; capable of reducing crosstalk; and suitable for an organic insulation film in various display operations. <P>SOLUTION: The photosensitive resin composition comprises: (a) an acrylic copolymer in which are copolymerized (i) a specific silsesquixane polyhedron oligomer-containing unsaturated compound, (ii) an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof, (iii) an epoxy group-containing unsaturated compound and (iv) an olefinic unsaturated compound; (b) a 1,2-quinone diazide compound; and (c) a solvent. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007119777(A) 申请公布日期 2007.05.17
申请号 JP20060288241 申请日期 2006.10.24
申请人 DONGJIN SEMICHEM CO LTD 发明人 YO TEFUN;KIM BYUNG-UK;YUN HYOKUMIN;KUU KIHYOKU;YUN JUUPYO;JON UICHORU;KIM DONMYON;CHE SANGAKU;LEE HOJIN;SHIN HONDE;LEE DONHYOKU
分类号 C08L33/00;C08K5/42;C08L83/07;G03F7/022;G03F7/075;H01L21/027 主分类号 C08L33/00
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