| 发明名称 |
LITHOGRAPHY APPARATUS, AND APPARATUS MANUFACTURING METHOD UTILIZING DYNAMIC CORRECTION OF MAGNIFICATIONS AND POSITIONS IN MASKLESS LITHOGRAPHY |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus, and an apparatus manufacturing method utilizing dynamic correction of magnifications and positions in the maskless lithography. <P>SOLUTION: The lithography apparatus is composed so that sizes and/or positions of features formed on a substrate are adjusted by adjusting irradiation intensity at the boundary between pattern features. <P>COPYRIGHT: (C)2007,JPO&INPIT |
| 申请公布号 |
JP2007123800(A) |
申请公布日期 |
2007.05.17 |
| 申请号 |
JP20060082197 |
申请日期 |
2006.03.24 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
DE JAGER PIETER W H;VENEMA WILLEM JURRIANUS;AKKER THEODORUS LEONARDUS VAN DEN;KESSELS LAMBERTUS G M;MULCKHUYSE WOUTER FRANS WILLEM |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
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| 主权项 |
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