发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device provided with an FUSI electrode and a polysilicon resistor and capable of being easily manufactured, and to provide a method of manufacturing the same. SOLUTION: In the semiconductor device having an MIS transistor provided with an FUSI gate electrode and the polysilicon resistor, a part provided in a contact formation region of the polysilicon resistor is silicified simultaneously with the gate electrode or an impurity diffusion region. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007123632(A) 申请公布日期 2007.05.17
申请号 JP20050315215 申请日期 2005.10.28
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 OGAWA HISASHI;KOTANI NAOKI;AKAMATSU SUSUMU;KUDO CHIAKI
分类号 H01L21/8234;H01L21/28;H01L21/768;H01L21/822;H01L23/522;H01L27/04;H01L27/06;H01L29/78 主分类号 H01L21/8234
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