发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device provided with an FUSI electrode and a polysilicon resistor and capable of being easily manufactured, and to provide a method of manufacturing the same. SOLUTION: In the semiconductor device having an MIS transistor provided with an FUSI gate electrode and the polysilicon resistor, a part provided in a contact formation region of the polysilicon resistor is silicified simultaneously with the gate electrode or an impurity diffusion region. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007123632(A) |
申请公布日期 |
2007.05.17 |
申请号 |
JP20050315215 |
申请日期 |
2005.10.28 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
OGAWA HISASHI;KOTANI NAOKI;AKAMATSU SUSUMU;KUDO CHIAKI |
分类号 |
H01L21/8234;H01L21/28;H01L21/768;H01L21/822;H01L23/522;H01L27/04;H01L27/06;H01L29/78 |
主分类号 |
H01L21/8234 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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