| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus and a method for manufacturing a color filter, with which the dispersion in the line width of color pixels formed after exposure and development processes can be further reduced, without changing the environmental state, such as temperature and humidity in a clean room. <P>SOLUTION: The exposure apparatus is equipped with a sealed chamber (A), housing the body of the exposure apparatus, an air supply pipe (B) for supplying dry air, and an air exhaust pipe (C) for exhausting dry air, in which a high-pressure compressor 1 to convert clean room air into high-pressure air, a drier 2, a pressure-reduction valve 3 are installed in a prestage to the air supply pipe to circulate and supply dry air at a pressure controlled to be a slightly higher than the pressure in the clean room. The absolute humidity of the dry air is controlled to be in the range of 1.0 g/m<SP>3</SP>to 10.0 g/m<SP>3</SP>. <P>COPYRIGHT: (C)2007,JPO&INPIT |
