发明名称 CONTINUOUS HEAT TREATMENT FURNACE AND HEAT TREATMENT METHOD OF SUBSTRATE USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a continuous heat treatment furnace superior in energy saving performance and stability in transporting, and capable of easily measuring a temperature of a substrate. SOLUTION: This continuous heat treatment furnace for performing heat treatment on a functional film material while transporting the substrate 1 provided with the functional film material on a base, comprises a rotating shaft 3 vertically mounted and rotated by a driving device, and a transporting tool 6 having beams 5 or wires radially extending from the rotating shaft 3 in the horizontal direction, in plural sets of at least two each, and further comprises a transporting mechanism for transporting the substrate 1 loaded on the transporting tool 6 by continuously or intermittently rotating the transporting tool 6 in the horizontal direction by rotating the rotating shaft 3. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007120894(A) 申请公布日期 2007.05.17
申请号 JP20050315866 申请日期 2005.10.31
申请人 NGK INSULATORS LTD 发明人 ARAI MAKOTO;KONDO YOSHIO
分类号 F27B9/16;B65G49/00;B65G49/07;F27B9/34;F27B9/36;F27B9/38;F27B9/39;H01L21/677 主分类号 F27B9/16
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