| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning solution and a cleaning method using the solution, by which a photoresist or the debris thereof and an organosiloxane reflection-preventing film or a shape protective film, for example, can be removed without corroding the material of a substance to be treated and particularly films with low dielectric constants, group 9 metals or the alloys thereof, and group 11 metals. SOLUTION: Treatment is performed by using the cleaning solution comprising 0.01 to 10% by weight potassium hydroxide and/or sodium hydroxide, a 5 to 80% by weight water-soluble organic solvent, a 0.0001 to 10% by weight corrosion inhibitor for group 9 metals or the alloys thereof or group 11 metals, and water. COPYRIGHT: (C)2007,JPO&INPIT |
