发明名称 |
Method and structure for sample preparation for scanning electron microscopes in integrated circuit manufacturing |
摘要 |
A method for using a calibration standard. The method includes providing a calibration standard. In a specific embodiment, the calibration standard has a substrate, a thickness of material having an edge region; and a conformal material of uniform thickness disposed on the edge region. The standard also has an upper surface pattern having the uniform thickness provided on the edge region. The method also includes using the upper surface pattern for a calibration process on a scanning electron microscope process.
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申请公布号 |
US2007111518(A1) |
申请公布日期 |
2007.05.17 |
申请号 |
US20060378888 |
申请日期 |
2006.03.16 |
申请人 |
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION |
发明人 |
WAN XUDONG;GUO LIQI;WANG EUGENE |
分类号 |
H01L21/44;H01L21/4763 |
主分类号 |
H01L21/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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